Isostatic Pressure Artificial Graphite Material for Semiconductor Industry

Product Details
Customization: Available
Bulk Density: 1.80-1.91g/cm3
Electrical Resistivity: 10-13
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  • Isostatic Pressure Artificial Graphite Material for Semiconductor Industry
  • Isostatic Pressure Artificial Graphite Material for Semiconductor Industry
  • Isostatic Pressure Artificial Graphite Material for Semiconductor Industry
  • Isostatic Pressure Artificial Graphite Material for Semiconductor Industry
  • Isostatic Pressure Artificial Graphite Material for Semiconductor Industry
  • Isostatic Pressure Artificial Graphite Material for Semiconductor Industry
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Basic Info.

Model NO.
GM-1
Compressive Strength
More Than 80MPa
Thermal Conductivity
85-139.2W/M*K
Temperature Resistance
No More Than 4350 Degree
Ash Content
0.03%
Speciality
Ultrafine Granule Structure
Speciality 1
High Hardness
Speciality 2
Good Anti-Oxidation Performance
Speciality 3
High Machining Accuracy
Speciality 4
Good Conductivity
Speciality 5
High Resistivity
Speciality 6
Sufficient Mechanical Strength
Speciality 7
Small Porosity and Dense Structure
Type
Graphite Mold
Carbon Content
High-Carbon
Forming Way
Molded Graphite
Crystal Morphology
Compact Crystalline Graphite
Composition
99.9% High Purity Graphite
Grade
High Purity Graphite
Transport Package
Cartons in Wooden Cases
Specification
Customized
Trademark
L. T
Origin
Cn
HS Code
3801909000
Production Capacity
30 Ton/Month

Product Description

Isostatic Pressure Artificial Graphite Material For Semiconductor Industry  
                                                                    lttrade.en.made-in-china.com






A: Company profile
    L.T Group has a comprehensive product and technology portfolio that focuses on four field
of graphite - ultrafine particle graphite mould, graphite electrode, graphite crucible, as well as
other products mainly made of graphite.
     Graphite materials exhibit unique properties such as good electrical and thermal conductivity,
heat and corrosion resistance, low friction, and reduced weight while at the same time maintaining
high strength. Due to the shortage of energy and raw materials, our high performance products
made from graphite are in increasingly high demand in industries. They also play a progressively
important role in everyday life, thereby substituting traditional materials.
Isostatic Pressure Artificial Graphite Material for Semiconductor Industry

B: Why choose us
  Graphite mould plays a dual role in the process of diamond tools manufacture:Heating element
and Supporting mold.The quality of graphite mold is very important, will directly affect the next
diamond tools' accuracy and appearance.So, which kind of graphite mold is suitable for sintering
diamond tools:

  a: Good performance on conductivity and high rate resistivity
  b: Enough Mechanical Strength
  c: Good performance on Oxidation resistance
  d: Durable


  Our mold features:
Raw materials is very important, We only use Ultrafine particle structure, High purity and High
graphitization raw graphite materials.

Our finished graphite mold is:
  a: dense structure and low porosity
  b: Fined surface and low rate heat-deformation
  c: High mechanical strength and machining accuracy
  d: Oxidation resistance and durable

Isostatic Pressure Artificial Graphite Material for Semiconductor Industry

C: Product features
1.The processing materials are ultrafine granule structure, high purity and graphite with high
graphitization degree.
2.High hardness, good anti-oxidation performance and high machining accuracy
3.Good conductivity, high resistivity, sufficient mechanical strength
4.Small porosity and dense structure.
5.Excellent thermal shock resistance, conductive and thermal conductivity.
6.High temperature resistance, corrosion resistance, acid and alkali resistance, good wear resistance.
7.Surface can be treated with anti-oxidation.
Isostatic Pressure Artificial Graphite Material for Semiconductor Industry

D: Processing method
1. Customer provide design drawings.
2. Our technical team will check, analyze the drawings, and divide the drawing to reasonable parts
if needed, and prepare proper graphite blocks .Our mechanics will design and customize grinding wheel.
3. Our workers will grinding and polishing graphite block according to the instructions of mechanics.
This process may need operating few times if needed.We will strictly keep deviation within ±0.03-0.08mm.
4. Then our packing team will assembling different parts into a whole graphite mold.During the
assembling period, unqualified products will be picked out.
Isostatic Pressure Artificial Graphite Material for Semiconductor Industry

E: Attribute table

 
Description LT-4 LT-5 LT-7 LT-8
Bulk Density  g/cm3 1.80 1.85 1.85 1.91
Electrical Resistivity  uΩ·m 10-12 8.5-10 11-13 11-13
Flexural Strength  MPa  43 46 51 60
Compressive Strength  MPa  80 85 115 135
Thermal Conductivity  W/m*K 110 139.2 85 85
Temperature resistance ºC 4350 4350 4350 4350
Ash content  % 0.03 0.03 0.03 0.03


Isostatic Pressure Artificial Graphite Material for Semiconductor Industry






 

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