Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry

Product Details
Customization: Available
Carbon Content: High-Carbon
Density: 2.17 g/cm3
Still deciding? Get samples of US$ 12/Piece
Request Sample
Manufacturer/Factory, Trading Company
Diamond Member Since 2017

Suppliers with verified business licenses

Audited Supplier

Audited by an independent third-party inspection agency

Importers and Exporters
The supplier has import and export rights
High Repeat Buyers Choice
More than 50% of buyers repeatedly choose the supplier
Fast Delivery
The supplier can deliver the goods within 30 days
R&D Capabilities
The supplier has 1 R&D engineers, you can check the Audit Report for more information
to see all verified strength labels (12)
  • Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
  • Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
  • Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
  • Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
  • Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
  • Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Find Similar Products
  • Overview
  • Product Description
  • Company Profile
  • Our Advantages
  • Product Parameters
Overview

Basic Info.

Model NO.
LTPG-1
Resistivity
Less Than 0.063
Compressive Strength
More Than 383MPa
Elasticity Modulus  
59 Gpa
Thermal Expansion Coefficient
0.63 10-6/Degree
Ash Content
Less Than 0.045%
Grade
Industrial Grade
Crystal Morphology
Compact Crystalline Graphite
Type
Pyrolytic Graphite
Composition
99.9% Carbon
Forming Way
Chemical Vapor Deposition-CVD
Transport Package
Cartons in Wooden Cases
Specification
Customized
Trademark
L. T graphite
Origin
China
HS Code
3801909000
Production Capacity
150000/Month

Product Description

 
Product Description

Pyrolytic graphite is pyrolytic carbon with high crystalline orientation deposited by chemical vapor phase deposition on a graphite substrate at 1800°C to 2000°C under a certain furnace pressure of high-purity hydrocarbon gas. It has a high density (2.20g/cm ), high purity (impurity content 0.0002%) and anisotropy in thermal, electrical, magnetic and mechanical properties. It can still maintain a vacuum of 10mmHg at around 1800°C.

Pyrolytic graphite application examples:

1. The heating rate of PG/PBN heater is extremely fast, and the outgassing rate is extremely low. This heating material is an ideal heating material for semiconductor industries and applications that require high vacuum, high temperature and high purity. For example: semiconductor substrate heating (MBE, MOCVD, PVD, CVD, etc.), superconductor substrate heating, rapid annealing furnace, electron microscope sample heating, metal evaporation heat source, gas heating nozzle heater, etc.
2. Pyrolytic graphite has outstanding characteristics such as low density, high temperature, high strength, good ablation resistance, and excellent thermal shock resistance. It is an ideal throat lining material for tactical missile engines.
3. Pyrolytic graphite is a very common ion beam grid preparation material, which has the characteristics of high purity, low corrosion rate and limited thermal expansion. The role of the ion beam grid is to extract the ions in the discharge chamber plasma through a series of electrostatic grids with many small holes in a precise arrangement.
4. PG crucible has the advantages of high purity, compactness, low air permeability (same as glass), high temperature resistance, acid and alkali corrosion resistance, resistance to sudden cooling and sudden heat changes, and easy washing. PG crucibles are superior to platinum, silver, nickel and other crucibles in some respects.

Main market applications:

  1. Application of standard samples and standard analysis methods
  2. Preparation of high-purity metal oxides, ion plating and other fields
  3. Smelting crucible for steaming aluminum in semiconductor industry
  4. Evaporation vessels for OLED industry
  5. PG coating application, through the coating method, reflects the characteristics of high density, low outgassing rate, corrosion resistance and oxidation resistance of pyrolytic graphite, and is widely used in the following fields:
  6. In MOCVD equipment, graphite base coating for GaN epitaxial growth.
  7. Graphite pedestal coating for monocrystalline silicon epitaxial growth, flat pedestal, circular pedestal, three-dimensional pedestal.
  8. Graphite chassis coating for monocrystalline silicon device sintering furnace.
  9. Surface coatings on graphite heaters (panel heaters, round heaters, cartridge heaters, etc.).
  10. Graphite sagger coating for sintering in various oxide tunnel kilns.
  11. Graphite base coating for powder metallurgy continuous sintering.
Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Company Profile

L.T Group has a comprehensive product and technology portfolio that focuses on four field of graphite - ultrafine particle graphite mould,graphite electrode, graphite crucible, as well as other products mainly made of graphite.

Graphite materials exhibit unique properties such as good electrical and thermal conductivity, heat and corrosion resistance, low friction, and reduced weight while at the same time maintaining high strength. Due to the shortage of energy and raw materials, our high performance products made from graphite are in increasingly high demand in industries. They also play a progressively important role in everyday life, thereby substituting traditional materials.

Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Our Advantages

Strong production capacity, L.T Graphite, your choice for rapid standardization and bulk quantity supply

High-purity graphite: an annual output of 30,000 tons of isotropic high-purity graphite. Widely used in aerospace, military industry, nuclear industry, electric spark, solar photovoltaic, hydrogen fuel cell, negative electrode material, semiconductor, metal crystallizer, 5G chip and other industries, also used in light industry, textile, food, medical treatment, cooking utensils and daily necessities and many other industry applications.

Medium particle graphite: an average annual output of 20,000 tons of medium particle graphite blocks. In 2022, to match the peak demand of the lithium battery industry, the output reached 25,000 tons. Mainly used in graphite chemical equipment, vanadium-titanium alloy, silicon-calcium alloy, silicon carbide, transitional metal smelting and other industries

Graphite electrodes: an average annual output of 50,000 tons of φ600-φ850 ultra-high-power graphite electrodes (UHP), and 40,000 tons of high-power (HP) and ordinary-power graphite electrodes (RP). Products are widely used in the production of alloy steel or other metal and non-metal materials in electric arc furnaces and submerged arc furnaces.

Graphite synthetic materials: L.T impregnated graphite, rich in products, mainly impregnated resin graphite products, impregnated copper graphite products, high-purity thermal piezoelectric carbon, antimony impregnated molded carbon graphite sealing products, vacuum pump equipment, vacuum furnace, carbon for machinery Graphite products. Mass production, with an average daily production capacity of 100,000 pieces.

In 2015, the company invested in pantograph carbon skateboards to achieve large-scale mass production. At this stage, it has an annual production capacity of 200,000 carbon skateboards, of which metal-impregnated carbon skateboards and pure carbon skateboards each account for 50% of the production capacity. It has already supplied railways and urban rail transit in many cities in China, and its products are currently exported to Southeast Asian and South American countries.
 

Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry
Product Parameters

The technical parameters of pyrolytic graphite are as follows:

Pyrolytic Graphite Plate for Single Crystal Silicon Growth in Semiconductor Industry

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now
Contact Supplier